10 Jan '13 12:42>
At my company we have two sputtering machines that deposit metals or insulators or just about anything on a substrate in a good vacuum using either RF or DC technology. The machines are water cooled and we use distilled water in the chiller loop.
We found out citric acid powder added to the water at about 10% by weight ratio and running for several hours would take out the rust powder and so forth.
It certainly did, great job in fact, polyflow tubing that was brown with rust deposits got cleaned to brand new looking and so forth.
But when I measure the resistance of the mixture with a DVM (Fluke 77) I found it near impossible to measure correctly because the metal parts inside did some kind of galvanic action that made for about 1/3 volt which upsets the DVM resistance reading.
Anyone here know how to measure the resistance of water with citric or other acids in it? I made up a 10% solution of citric acid in a small container, 1 liter and tried to measure the resistance of the water and it started out at some figure like 10 Kohms but then the reading started going up and then to my surprise, going back down after a few minutes, getting to under 3000 ohms and falling but putting the DVM in millivolt mode showed I was reading about 80 millivolts which will also upset the resistance measurement. The DVM sends out a small voltage which it puts across a resistance and then reads the resultant current and converts that to a resistance reading so any voltage generated by the resistor to be measured upsets the actual resistance reading.
So how can I be generating a millivolt signal when I am using standard voltage probes, which have the exact same metal in both positive and negative leads? I thought you had to have dis-similar metals to generate a galvanic voltage.
And how do you measure the resistance of a water/acid solution accurately?
It is a big deal because the cooling water touches the target to cool it which can get very hot and any conductivity in the cooling water sucks off some of the energy used to make the sputtering plasma so the higher the cooling water resistance, the more energy is used for the actual sputtering process.
We found out citric acid powder added to the water at about 10% by weight ratio and running for several hours would take out the rust powder and so forth.
It certainly did, great job in fact, polyflow tubing that was brown with rust deposits got cleaned to brand new looking and so forth.
But when I measure the resistance of the mixture with a DVM (Fluke 77) I found it near impossible to measure correctly because the metal parts inside did some kind of galvanic action that made for about 1/3 volt which upsets the DVM resistance reading.
Anyone here know how to measure the resistance of water with citric or other acids in it? I made up a 10% solution of citric acid in a small container, 1 liter and tried to measure the resistance of the water and it started out at some figure like 10 Kohms but then the reading started going up and then to my surprise, going back down after a few minutes, getting to under 3000 ohms and falling but putting the DVM in millivolt mode showed I was reading about 80 millivolts which will also upset the resistance measurement. The DVM sends out a small voltage which it puts across a resistance and then reads the resultant current and converts that to a resistance reading so any voltage generated by the resistor to be measured upsets the actual resistance reading.
So how can I be generating a millivolt signal when I am using standard voltage probes, which have the exact same metal in both positive and negative leads? I thought you had to have dis-similar metals to generate a galvanic voltage.
And how do you measure the resistance of a water/acid solution accurately?
It is a big deal because the cooling water touches the target to cool it which can get very hot and any conductivity in the cooling water sucks off some of the energy used to make the sputtering plasma so the higher the cooling water resistance, the more energy is used for the actual sputtering process.